Litmas® RPS 1501 and 3001 Integrated Plasma Source and Power-Delivery System Advanced energy

Mã sản phẩm: |
Thương hiệu: Advanced energy

Giá bán: Liên hệ
The Litmas® Remote Plasma Source (RPS) delivers high concentrations of reactive gas species to enable advanced process applications, such as thin-film deposition, wafer pre-clean, photoresist strip, and abatement. Its small footprint, high performance, ease of use, and low cost of ownership allow you to focus on developing critical plasma-based processes with lower device damage, higher throughput, and higher yields.

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Thông tin sản phẩm

Benefits:

Reduced charge damage to fragile device structures, enabling higher yields
Generates high reactive specie fluxes, delivering higher process rates
Broadens the range of process chemistries, enabling a wide
range of applications
Provides fast matching, stable power delivery for precise
process control
Comprises one small-footprint package, providing reduced CoO


Features:

Delivers reactive gas species to the process chamber
Provides the highest available plasma power density
Uses durable SiO2 or Al2O3 chamber materials
Uses patented LitmasMatch™ solid-state power-delivery topology
Integrates the power supply, match, and plasma chamber in one package


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