Crystal® Advanced energy

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Thương hiệu: Advanced energy

Giá bán: Liên hệ
Precise power control is essential for high-density, uniform, reactively sputtered films. The Crystal® power supply offers process engineers and operators a repeatable method for improving throughput and yield with quick yet stable power, fast arc detection, and low arc energy.

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Benefits:

Optimized process stability and yield
Enhanced flexibility
Increased throughput
Reduced cost of ownership
World-class service, support, and training

Features:

60, 100, 120, 150, and 180 kW models
Lowest stored energy in the industry (1 mJ per kW)
Fastest arc detection and response in the industry (microsecond scale)
Wide output impedance range
Suitable for all processes (ZnO, SnO2, TiO2, AI203, Si3N4, Si, SiO2)
Single-box solution—no hardware or setting changes required when changing sputtering materials
Wide tap range (2: 1 voltage range at full power on single tap)
Multiple taps with high strike (>3000 V)
Power, current, and voltage regulation modes
Control and interface flexibility

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