EUV sources for HVM are expected to operate at pulse repetition rates of 10 kHz or higher. To simulate the effects of operating at such pulse rates on the optics lifetime, for example, high repetition rate metrology sources are needed.
The Energetiq EQ-10HR EUV Source is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10HR high repetition rate EUV source is uniquely suited for metrology and research applications where simulation of HVM is required.
- Enables high volume manufacturing (HVM) simulation - Continuous mode, 24/7
Small plasma size
- Below 1mm diameter
Unique patent-pending electrodeless Z-Pinch technology
- Low debris / low consumable cost
10 kHz pulse rate
Cost-effective and compact
- Small footprint
CE-Mark and SEMI S2-0703 compliant